Report Description
A recent market
intelligence report that is published by Data Insights Partner on the
global Plasma Etching Equipment Market makes an offering of in-depth analysis of segments and
sub-segments in the regional and international Global Plasma
Etching Equipment market. The research also emphasizes on the impact of
restraints, drivers, and macro indicators on the regional and global Plasma
Etching Equipment Market over the short as
well as long period of time. A detailed presentation of forecast, trends, and
dollar values of global Plasma Etching Equipment Market is offered. In accordance with the report, the global
Plasma Etching Equipment Market is projected to
expand with healthy CAGR over the period of forecast.
Market Insight, Drivers,
Restraints& Opportunity of the Market:
Plasma has been
recognized as the fourth state of matter. It is chiefly an ionized gas. When
sufficient energy is provided, it sets free some electrons from the atoms or
molecules, thereby allowing both species, ions and electrons, to coexist.
Etching in a discharge environment is accomplished by providing active species,
which react with the substrate to form volatile products
Extensive
technological advancement is taking place in integrated circuit manufacturing
techniques across different parts of the world. Since plasma etching is being
widely implemented in the fabrication process of integrated circuit, this is
favoring the increase in adoption of plasma technology for etching purposes.
Conventional etching or wet etching technique is carried out with various
corrosive wet chemical acids, making it difficult to fabricate small circuits
and avoid over-etching. This is boosting the demand for plasma etching
equipment, since traditional etching methods lack the capability to fabricate
small geometries so precisely. Plasma etching provides increased control for
the etchants, and operating environment (pressure and temperatures) in which
the etching will occur. Further, plasma etching provides the waterless method
of etching material and thus protects water sensitive wafers from getting
contaminated. The above advantageous features of plasma etching over
traditional etching techniques is favoring market growth.
The cost of
building a system for plasma etching necessitates high capital investment for
the etching equipment. High demand for miniaturization of semiconductor chips
along with high precision manufacturing requires highly advanced machinery. The
need for specialized and expensive etching equipment is hindering market growth.
Strategic alliance among key players and technological advancement would
provide the global Plasma Etching Equipment market an opportunity to propel
during the forecast period.
Segment Covered:
This market
intelligence report on the Global Plasma Etching Equipment Market encompasses
market segments based on surface type, etching type, end use and country.
In terms of surface type, the Global Plasma
Etching Equipment Market is classified into:
·
Flat Top Surface
·
Curved Top
Surface
·
Nano-structure Surface
·
Others
In terms of etching type, the Global Plasma
Etching Equipment Market is classified into:
·
Physical Sputtering
·
Chemical Plasma
Etching
·
Reactive Ion
Etching
In terms of application, the Global Plasma
Etching Equipment Market is classified into:
·
Semiconductors/Integrated
Circuits
·
Dielectrics
·
Plastics/Polymers
By country/region, the Global Plasma Etching Equipment Market has been divided
into:
·
North America
(the U.S., Canada)
·
Latin America
(Brazil, Mexico, Argentina and other countries)
·
Europe (Germany,
France, the U.K., Spain, Italy, Russia, and other countries)
·
Asia Pacific
(India, Japan, China, Australia and New Zealand and other countries)
·
Middle East and
Africa (GCC, South Africa, Israel and Other countries)
Profiling of Market Players:
This business
intelligence report offers profiling of reputed companies that are operating in
the market. Companies such as:
·
Applied
Materials Inc.
·
Hitachi High
Technologies America, Inc.
·
Lam Research
Corporation
·
Tokyo Electron
Limited
·
SAMCO Inc.
·
Oxford
Instruments plc.
·
Nordson
Corporation
·
Orbotech Ltd.
·
Allwin21 Corp.
·
Plasma Etch,
Inc.
Other companies
are profiled into detail so as to offer a glimpse of the market leaders.
Moreover, parameters such as Global Plasma Etching Equipment related investment
& spending and developments by major players of the market are tracked in
this global report.
Report Highlights:
In-depth
analysis of the micro and macro indicators, market trends, and forecasts of
demand is offered by this business intelligence report. Furthermore, the report
offers a vivid picture of the factors that are steering and restraining the
growth of this market across all geographical segments. In addition to that,
Growth Matrix analysis is also provided in the report so as to share insight of
the investment areas that new or existing market players can take into
consideration. Various analytical tools such as DRO analysis, Porter's five
forces analysis has been used in this report to present a clear picture of the
market. The study focuses on the present market trends and provides market
forecast from the year 2020-2028. Emerging trends that would shape the market
demand in the years to come have been highlighted in this report. A competitive
analysis in each of the geographical segments gives an insight into market
share of the global players.
Salient Features:
Ø
This study
offers comprehensive yet detailed analysis of the Global Plasma Etching Equipment market, size of the market (US$ Mn), and Compound Annual Growth
Rate (CAGR (%)) for the period of forecast: 2020-2028, taking into account 2019
as the base year
Ø
It explains
upcoming revenue opportunities across various market segments and attractive
matrix of investment proposition for the said market
Ø
This market
intelligence report also offers pivotal insights about various market
opportunities, restraints, drivers, launch of new products, competitive market
strategies of leading market players, emerging market trends, and regional
outlook
Ø
Profiling of
key market players in the world Global Plasma Etching Equipment Market is done by taking into account various parameters such as
company strategies, distribution strategies, product portfolio, financial performance,
key developments, geographical presence, and company overview
Ø
The data of
this report would allow management authorities and marketers of companies alike
to take decision when it comes to launch of products, government initiatives,
marketing tactics and expansion, and technical up gradation
Ø
The world
market for Global Plasma Etching Equipment caters to the needs of various stakeholders pertaining to this
industry, namely suppliers, manufacturers, investors, and distributors for Global
Plasma Etching Equipment market. The research also caters to the rising needs of
consulting and research firms, financial analysts, and new market entrants
Ø
Research
methodologies that have been adopted for the purpose of this study have been
clearly elaborated so as to facilitate better understanding of the reports
Ø
Reports have
been made based on the guidelines as mandated by General Data Protection
Regulation
Ø
Ample number
of examples and case studies have been taken into consideration before coming
to a conclusion
Reasons to buy:
v
Identify
opportunities and plan strategies by having a strong understanding of the
investment opportunities in the Global Plasma Etching Equipment market
v
Identification
of key factors driving investment opportunities in the Global Plasma
Etching Equipment market
v
Facilitate
decision-making based on strong historic and forecast data
v
Position
yourself to gain the maximum advantage of the industry’s growth potential
v
Develop
strategies based on the latest regulatory events
v
Identify key
partners and business development avenues
v
Respond to
your competitors’ business structure, strategy and prospects
v
Identify key
strengths and weaknesses of important market participants